The Film degassing chamber achieves efficient degassing with remarkably low flow resistance at flow rates up to 6 mL/min by employing a flat reinforced Teflon™ AF membrane. The construction is completely metal-free yet compatible with all organic solvents including hexane and HFIP. Wetted materials are Teflon™ AF, PEEK and carbon; internal volume is 500 µL with 1/4-28 UNF flat-bottom ports. To take full advantage of it, combine it with CPD (constant performance degassing) vacuum pumps that deliver variable vacuum levels.
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Product / Chromatography
